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    The Role of Gases in Semiconductor Epitaxy
    The main gas sources used for silicon epitaxial growth are hydrogen and chlorosilanes, such as silicon tetrachloride (SiCl4), trichlorosilicon (SiHCl3), dichlorosilane (SiH2Cl2).
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    Let's See Our Sulfur Dioxide Gas Factory
    800L sulfur dioxide production completed
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    Helium Gas Related Data
    Helium is a colorless, odorless, non-flammable gas with an air content of about 5.2 parts per million. Chemically completely inactive, usually not combined with other elements or compounds. Theoretically, it can be separated from the air, but because its content is too thin, helium is separated and refined from natural gas containing about 0.5% helium in industry.
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    Hydrogen Chloride Gas Export to Thailand
    Hydrogen chloride Gas export to Bangkok, Thailand - Safe and Efficient, Customer First
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