Why is hydrogen chloride (HCl) indispensable in modern semiconductor fabs?

HCl gas plays a pivotal role in chip manufacturing due to its unique chemical properties:

• Precision Etching: Enables nanoscale removal of silicon nitride (Si₃N₄) and silicon dioxide (SiO₂) layers during plasma etching, critical for 5nm/3nm node FinFET and GAA transistors.

• CVD/ALD Chamber Cleaning: Eliminates residual silicon, tungsten, and metal-organic deposits in reactors, ensuring contamination-free thin film deposition.

• Epitaxial Growth: Enhances silicon crystal purity in 300mm wafer epitaxy, directly impacting chip performance and yield.

• Photolithography Support: Neutralizes alkaline developers in EUV lithography processes.

What makes your HCl gas suitable for cutting-edge semiconductor processes?

Our HCl gas exceeds industry benchmarks with:

• 99.999% (5N) Purity: Impurity levels controlled at <0.1 ppm for moisture (H₂O), oxygen (O₂), and particulates.

• SEMI C3.61 Certification: Compliant with global semiconductor material standards for trace metals (Na, K, Fe <5 ppb).

• Strict Process Control: Produced via triple-distillation in quartz-lined reactors to prevent metallic contamination.

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How do your packaging solutions address fab requirements?

We provide two optimized configurations:

47L Cylinder (25kg HCl Gas) : Ideal for R&D labs, pilot lines, and low-volume production.

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• Advantages:

  • 316L electropolished stainless steel interior.

  • CGA 330 valve with PTFE seals.

  • Pre-purged with nitrogen to <10 ppb moisture.

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880L Cylinder Bundle (500kg HCl Gas) : Designed for high-volume fabs with 24/7 operations.

• Advantages:

  • Reduces changeover frequency by 80% vs. standard cylinders.

  • Integrated pressure regulators (0-600 psi adjustable output).

  • DOT/TPED-certified for bulk hazardous gas transport.

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What safety measures ensure reliable HCl gas delivery?

Leak Testing: Helium mass spectrometer checks at 1×10⁻¹⁰ atm·cc/sec sensitivity.

Material Compatibility: Valves and cylinders resist HCl corrosion (Hastelloy optional).

Emergency Response: 24hours with multilingual technical support.

Compliance Documentation: Full MSDS, COA, and TDS aligned with REACH, RoHS, and ITAR.

Case Study: Enabling 3nm Chip Production
A leading foundry achieved 99.98% etch uniformity by switching to our HCl gas, reducing particle defects by 40% in high-aspect-ratio contact (HARC) etching. Read the full report on our website.

Why Partner With Us?

✅ Defect-Free Guarantee: 100% batch traceability with impurity analytics.
✅ Scalable Supply: From 25kg trial orders to 10-ton annual contracts.