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Nitrogen Trifluoride NF3 Gas
Nitrogen trifluoride (NF₃) is an inorganic compound, existing as a colorless, non-flammable gas with a moldy odor at room temperature and pressure. Mainly used in plasma etching and chamber cleaning processes during the manufacture of semiconductor chips and liquid crystal panels. As it can efficiently remove impurities from the surfaces of silicon and silicon dioxide, it is crucial for improving the precision and yield of integrated circuits.
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Product Description
Nitrogen trifluoride (NF₃) is an important inorganic compound. The following is a detailed introduction:
Basic information
The chemical formula is NF₃, with a molecular weight of approximately 71.01 and a CAS number of 7783-54-2. It appears as a colorless gas with a musty odor. It is non-flammable but can support combustion and is classified as a toxic gas under category 2.3.
Main uses
It is often used as an etching gas in semiconductor manufacturing processes, featuring a higher etching rate and selectivity for silicon and silicon nitride, and leaving no surface contamination. It is also employed as an oxidizer in high-energy fuels and rocket propellants, and serves as a fluorinating agent and raw material for the preparation of other nitrogen fluorides.
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